MAPPER Lithography

MAPPER talk

MAPPER Press

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MAPPER Lithography Content

The system offers significant benefits for IC manufacturers and design companies that want to extend the design and manufacturing capabilities of their business. The benefits include:

  • Lithography at advanced technology nodes, 40 nm, 28 nm, 20 nm and beyond
  • Significant throughput performance on 300mm wafers
  • No masks are required, saving the cost of (immersion) masks
  • Electron beam lithography can be integrated in a standard CMOS flow in existing fabs
  • Electron beam technology is specifically suited for printing 2D, random structures (i.e. contact, via layers and cutting patterns).
  • Significant reduction of investment risk and financial hurdle
  • A faster time-to-market for new designs

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