MAPPER Lithography

MAPPER talk

MAPPER Press

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MAPPER Lithography Content

MAPPER Lithography, based in Delft, The Netherlands, and founded out of Delft University of Technology, is developing a groundbreaking maskless lithography infrastructure for the semiconductor industry. Our tools utilize an innovative multiple e-beam technology with which next generation semiconductors can be manufactured in a more cost effective fashion. It makes the traditionally used mask redundant and combines high resolution and high productivity. MAPPER employs 250 people and has an optics manufacturing facility in Moscow, Russia.

Historic achievement overview

2005

2005-2006

Demonstration of electron optics components:

 

  • MEMS lens arrays
  • High brightness, high current ebeam source
  • irst exposures with parallel electron beams
2006

2006-2007

End-to-end system proof of concept:

 

  • 110-beam electron optics demonstration
  • Blanking of individual electron beams with light signals
  • First analysis of beam to beam exposure performance
2007

2007-2009

Industrial version of prototype:

 

  • System for 300 mm wafer exposures
  • Beam-to-beam CD uniformity demonstration of 4.5 nm over 90% of beams
  • Obtained certificate for Semi-S2 safety compliancy
2009

2009-2011

Two prototype systems shipped to semiconductor manufacturers

 

  • Shipped to TSMC, the world’s largest manufacturer of chips
  • Shipped to CEA-LETI, a French R&D institute
  • Demonstration of 10 wph throughput capability
  • Contamination control solution established
2011

2011-2013

Design for manufacturing tool ready

 

  • Modular system concept scalable to 100 wph
  • Includes overlay capability
  • Fully compatible with 300 mm wafer manufacturing fab
2013

2013-2014

First shipment of manufacturing system

 

  • System installed at CEA-Leti
  • Directly connected to wafer track (300 mm wafers)
  • Mix-and-match capability with optical lithography

 

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